Mask-Aligner is the basic facility for photolithography. This system is employed for aligning the patterns of the different layers as well as exposing the photo resist. The aligning procedure may be performed manually (in the left system) or automatically (in the more sophisticated system in the left).  

Mask Aligner consisting of:

- Configured for Top Side Alignment with Backside IR.

- Suss CIC500 Power Supply

- 350 Watt lamp-house

- UV400 Exposure Optics

- Set of 10x and 15x Eyepieces

- 3.2x, 10x, 20x, H32x Objectives

- Hard Contact, Soft Contact, and Vacuum Contact modes

- Mask Holder, Qty 1 included (additional can be ordered)

- Set of Chucks (2"/3"/IR Chucks)

- Additional wafer chucks, mask holders, or consumables such as bulbs can be ordered at any time.

- Suss Accessories Case

 

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