Jan 2004

First name: Arash   
Last name: Khajooeizadeh           

E-mail:        arash.kha@gmail.com

Personal Data:
Born: April 8, 1981, Tehran

Mailing Address: Apt 14, No. 55, Mirhoseini St, North Alameh St,Saadat Abad, Tehran, Iran

·      University of Tehran, Electrical Engineering (4^th year)

Entered September 1999 (Ranked 155 among more than 300,000                 

Applicants in National Universities Entrance Exam.)

Class standing: 4/120,

Cumulative Grade Point Average (GPA): 17.70 (out of maximum 20)

·      Allameh Helli High school (Affiliated to NODET, the National

Organization for Development of Exceptional Talents)

High school diploma with Cumulative GPA 19.75 out of maximum 20,

1999 (first rank in class)

Research assistant, Thin Film Lab., University of Tehran

·      Fabrication of Vertical Transistors

·      Experience in fabrication of poly silicon thin-film transistors on glass and polymers

·      Experience in Metal Induced Crystallization (MIC) using metals such as Ni and Cu for Si

·      Familiar with semiconductor sensors fabrication using silicon micromachining

·      Studying on stress assisted crystallization of silicon, in low temperatures

·      Studying on vacuum systems and pumps used for deposition chambers

·      Working with E-beam and sputtering systems.

Teaching Experience: 

·      Electrical Circuits Ι Teaching Assistantship, University of Tehran, Spring ‏2002

·      Electrical Circuits ΙΙ Teaching Assistantship, University of Tehran, Fall 2002

·      Electronics ΙΙΙ Teaching Assistantship, University of Tehran, Spring 2003

·      Micro-processor Lab Teaching Assistantship, University of Tehran, Fall 2003

·      Vertical MOSFET Transistors, as BS project

·      Stress assisted crystallization of  nickel induced silicon

·      Crystallization of Si-Ge in low temperatures on thin film of plastic

·      Several projects in computer programming

·      Hardware projects such as controlling a intelligent traffic light with microcontroller

·      IEEE student member for 4 years 1999-2003

·      Experience in C++, Pascal, Visual C++

·      Experience in HDL languages such as Verilog

·      Experience in 80X86 Assembly, Microcontrollers Assembly

·      Familiarity with simulation of semiconductor devices and processing with DESSIS and GENESISe

·      Familiarity with simulation of integrated circuits with HSPICE

·      TOEFL Computer Based: 257, equivalent to 617 Paper Based

·      Stress-Assisted Nickel-Induced Crystallization of Silicon on Glass, P. Hashemi, A. Khajooeizadeh, S. Mohajerzadeh, J. Derakhshandeh, M. Robertson,J.C. Bennett, A. Tonit

Eleventh Canadian Semiconductor Technology Conference, Ottawa, Canada -- 18-22 August 2003